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Three-dimensional molecular dynamics simulations are carried out to study the mechanism of nanometric processing of ion implanted monocrystalline silicon surfaces. Lattice transformation is observed during implantation and nano-indentation using radial distribution function and geometric criterion damage detection. Nano-indentation is simulated to study the changes of mechanical property. Implantation analysis shows the existence of amorphous phase. Indentation process shows the lattice evolution, which is beneficial for reducing fractures during processing. The indentation results reveal the reduction of brittleness and hardness of the implanted surface. The ion fluence is in direct proportion to the damage, and inverse to the hardness of the material. Experiments of ion implar, tation, nanoindentation, nano-scratching and nanometric cutting were carried out to verify the simulation results. 相似文献
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基于对人类社会发展历史和科学技术发展内在规律的认识,本文详细分析了制造发展的三个范式,论证了原子及近原子尺度制造是制造范式III的核心使能技术。文章回顾了国内外各机构对原子级制造研发规划现状,指出我国目前处于原子级制造技术发展的重要战略机遇期,并从设计、材料、加工和检测等角度分析了原子级制造的技术体系内涵;梳理了原子级表面制造、原子级结构制造、原子级测量与表征等领域的研究进展,呈现了当前具有原子级制造能力的部分代表性技术,包括原子级切削、原子级抛光、电化学加工、等离子体原子级加工技术、原子精准操控以及原子分辨测量与表征技术,并对原子级制造战略规划提出发展建议。 相似文献
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