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A novel metallo-organic chemical vapor deposition (MOCVD) technique has been applied to the preparation of the photocatalytic titanium dioxide supported on activated carbon. The effects of various condition parameters such as carrier gas flow rate, source temperature and deposition temperature on the deposition rate were investigated. The maximum deposition rate of 8.2 mg/(g.h) was obtained under conditions of carrier gas flow rate of 400 ml/min, source temperature of 423 K and deposition temperature of 913 K. The deposition rate followed Arrhenius behavior at temperature of 753 K to 913 K, corresponding to activation energy Ea of 51.09 kJ/mol. TiO2 existed only in anatase phase when the deposition temperature was 773 K to 973 K. With increase of deposition temperature from 1073 K to 1273 K, the rutile content sharply increased from 7% to 70%. It was found that a deposition temperature of 773 K and a higher source temperature of 448 K resulted in finely dispersed TiO2 particles, which were mainly in the range of 10-20 nm.  相似文献   
2.
Phenol degradation in photochemically enhanced Fenton process was investigated in this work. UV-VIS spectra of phenol degradation showed the difference between photo-Fenton process and UV/H2O2, which is a typical hydroxyl radical process. A possible pathway diagram for phenol degradation in photo-Fenton process was proposed, and a mathematical model for chemical oxygen demand (COD) removal was developed. Operating parameters such as dosage of H2O2 and ferrous ions, pH, suitable carrier gas were found to impact the removal of COD significantly. The results and analysis of kinetic parameters calculated from the kinetic model showed that complex degradation of phenol was the main pathway for removal of COD; while hydroxyl radicals acted weakly in the photo-Fenton degradation of phenol.  相似文献   
3.
INTRODUCTION For the degradation of high concentration wast- ewater with toxic and non-biodegradable pollutants, the UV/Fenton method has been proposed in recent years (Braun et al., 1991; Bossmann et al., 1998). The UV/Fenton system relies mainly on oxidative degradation reactions, where organic radicals are generated by photolysis of the organic substrate or by reaction with hydroxyl radicals. These radical intermediates are subsequently trapped by dissolved molecular oxygen and lea…  相似文献   
4.
The heterogeneous UV/Fenton process with the appropriate amount of Fe-Mn-Cu-Y as catalyst was developed and various operation conditions for the degradation of phenol were evaluated. The results indicated that by using the heterogeneous UV/Fenton process, the CODcr removal rate reached almost 100% for wastewater containing phenol. Compared with the homogeneous process, the developed catalyst could be used at wider pH range in the UV/Fenton process. Comparison of various heterogeneous process showed that heterogeneous UV/Fenton process was best. The heterogeneous UV/Fenton process with Fe-Mn-Cu-Y catalyst is highly efficient in degrading various organic pollutants.  相似文献   
5.
A novel fluidized electrochemical reactor that integrated advanced electrochemical oxidation with activated carbon (AC) fluidization in a single cell was developed to model pollutant p-nitrophenol (PNP) abatement. AC fluidization could enhance COD removal by 22%-30%. In such a combined process, synergetic effects on PNP and COD removal was found, with their removal rate being enhanced by 137.8% and 97.8%, respectively. AC could be electrochemically regenerated and reused, indicating the combined process would be promising for treatment of biorefractory organic pollutants.  相似文献   
6.
A novel fluidized electrochemical reactor that integrated advanced electrochemical oxidation with activated carbon (AC) fluidization in a single cell was developed to model pollutant p-nitrophenol (PNP) abatement. AC fluidization could enhance COD removal by 22%-30%. In such a combined process, synergetic effects on PNP and COD removal was found, with their removal rate being enhanced by 137.8% and 97.8%, respectively. AC could be electrochemically regen erated and reused, indicating the combined process would be promising for treatment of biorefractory organic pollutants.  相似文献   
7.
Degradation kinetics and mechanisms of phenol in photo-Fenton process   总被引:2,自引:0,他引:2  
INTRODUCTION Fenton process has been well studied recently for its prospective applications in unmanageable wastewater treatment (Legrini et al., 1993; Ollis and Al-Ekabi, 1993; Prousek, 1996). The high effi-ciency of this process is traditionally thought to be due to the generation of hydroxyl radical (HO?, which is of a high oxidation potential (E0 = 2.80 V) and can mineralize the organic compounds com-pletely to water and carbon dioxide. In acidic me-dium, this radical mechanism ca…  相似文献   
8.
A novel metallo-organic chemical vapor deposition (MOCVD) technique has been applied to the preparation of the photocatalytic titanium dioxide supported on activated carbon. The effects of various condition parameters such as carrier gas flow rate, source temperature and deposition temperature on the deposition rate were investigated. The maximum deposition rate of 8.2 mg/(g·h) was obtained under conditions of carrier gas flow rate of 400 ml/min, source temperature of 423 K and deposition temperature of 913 K. The deposition rate followed Arrhenius behavior at temperature of 753 K to 913 K, corresponding to activation energy Ea of 51.09 kJ/mol. TiO2 existed only in anatase phase when the deposition temperature was 773 K to 973 K. With increase of deposition temperature from 1073 K to 1273 K, the rutile content sharply increased from 7% to 70%. It was found that a deposition temperature of 773 K and a higher source temperature of 448 K resulted in finely dispersed TiO2 particles, which were mainly in the  相似文献   
9.
INTRODUCTION Nitrogen oxides (NOx) are significant airborne contaminants resulting from fossil fuels combustion. The use of metal chelate additives for combined re- moval of NOx and SO2 in FGD (flue-gas desulfuriza- tion) systems was investigated by several groups (Harriott et al., 1993; Tsai et al., 1989; Shi et al., 1996a; 1997). Fe(II)EDTA (EDTA, ethylenediami- netetraacetate) as an additive for removing nitric oxide (NO) from flue gas had been extensively stud- ied, with the …  相似文献   
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