| NiTi薄膜残余应力测试方法的探讨 |
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| 引用本文： | 周伟敏,周平南,吴廷斌.NiTi薄膜残余应力测试方法的探讨[J].实验室研究与探索,2007,26(1):16-18. |
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| 作者姓名： | 周伟敏 周平南 吴廷斌 |
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| 作者单位： | 上海交通大学,材料科学与工程学院,上海,200030 |
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| 摘 要： | 介绍了适用薄膜残余应力测量的弯曲法和X射线掠射法,重点介绍了一种新型测量薄膜残余应力的方法—纳米压痕法,并采用非球形压头纳米压痕法测量了NiTi薄膜的残余应力,对薄膜残余应力的测量进行了有益的探讨和尝试,结果表明纳米压痕技术可作为定性测量薄膜残余应力的有效手段。
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| 关 键 词： | 残余应力 薄膜 |
| 文章编号： | 1006-7167（2007）01-0016-03 |
| 收稿时间： | 2006-01-19 |
| 修稿时间： | 2006-01-19 |
The Residual Stress Study of NiTi Thin Films by Nanoindentation |
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| ZHOU Wei-min,ZHOU Ping-nan,WU Ting-bing.The Residual Stress Study of NiTi Thin Films by Nanoindentation[J].Laboratory Research and Exploration,2007,26(1):16-18. |
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| Authors: | ZHOU Wei-min ZHOU Ping-nan WU Ting-bing |
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| Institution: | School of Materials Science and Eng., Shanghai Jiaotong Univ., Shanghai 200030, China |
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| Abstract: | This paper introduced the methods for estimating residual stresses of thin films.They are X-ray glancing,contour method and nanoindentation method.NiTi thin films on silicon wafer were prepared by magnetron sputter-deposited method.The residual stress of NiTi thin films was measured by the three methods.The experimental results show that the nanoindentation method can be used to estimate the residual stresses of thin films qualitatively. |
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| Keywords: | NiTi |
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