| 衬底温度对金刚石膜选择性沉积的影响 |
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| 引用本文： | 张文广,夏义本,居建华,王林军.衬底温度对金刚石膜选择性沉积的影响[J].上海大学学报(英文版),2000,4(2):151-154. |
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| 作者姓名： | 张文广 夏义本 居建华 王林军 |
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| 作者单位： | 4。23，ZX，PY-W] Received Jun. 29，1999; Revised Sep. 14，1999 Supported by the Natural Scie |
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| 基金项目： | theNaturalScienceFundationofShanghaiMunicipalCommission!( 97ZF140 42 ) |
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| 摘 要： | 1 Ｉｎｔｒｏｄｕｃｔｉｏｎ Ｂｅｃａｕｓｅｏｆｔｈｅｃｏｍｂｉｎａｔｉｏｎｏｆａｎｕｍｂｅｒｏｆｆａｖｏｒａｂｌｅｐｒｏｐｅｒｔｉｅｓ,ｓｕｃｈａｓｈｉｇｈｈａｒｄｎｅｓｓ,ｈｉｇｈｃａｒｒｉｅｒｍｏｂｉｌｉｔｙａｎｄｂｒｅａｋｄｏｗｎｖｏｌｔａｇｅ,ｌａｒｇｅｂａｎｄｇａｐ ,ｌｏｗｄｉｅｌｅｃｔｒｉｃｃｏｎｓｔａｎｔ,ａｎｄｔｒａｎｓｐａｒｅｎｃｙｔｏｖｉｓｉｂｌｅｌｉｇｈｔ,ＩＲｌｉｇｈｔａｎｄｍｉｃｒｏｗａｖｅｓ,ｅｔｃ.1] ,ｄｉａｍｏｎｄｆｉｌｍｈａｓｂｅｅｎｃｏｎｓｉｄｅｒ ａｂｌｙｐｒｏｍ…
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| 收稿时间： | 29 June 1999 |
Effect of substrate temperature on the selective deposition of diamond films |
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| Wen-guang Zhang,Yi-ben Xia,Jian-hua Ju,Lin-jun Wang.Effect of substrate temperature on the selective deposition of diamond films[J].Journal of Shanghai University(English Edition),2000,4(2):151-154. |
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| Authors: | Wen-guang Zhang Yi-ben Xia Jian-hua Ju Lin-jun Wang |
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| Institution: | School of Material Science and Engineering, Shanghai University, Shanghai 200072, China |
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| Abstract: | Selective deposition of diamond film on patterned Si (100) substrates has been achieved by using microwave plasma chemical vapor deposition (MPCVD) method. The films have been characterized by scanning electron microscope (SEM) and Raman spectrum. The influence of substrate temperature on the nucleation behavior of diamond was discussed in detail and the optimized deposition condition has been obtained. |
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| Keywords: | diamond films deposition chemical vapor deposition (CVD) |
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