| Epitaxial α″-Fe_(16)N_2 Films Grown on NaCl (001) by Facing Target Sputtering |
| |
| 引用本文： | 赵慈,姜恩永,许英华,张宝峰,吴萍.Epitaxial α″-Fe_(16)N_2 Films Grown on NaCl (001) by Facing Target Sputtering[J].天津大学学报(英文版),2003,9(2). |
| |
| 作者姓名： | 赵慈 姜恩永 许英华 张宝峰 吴萍 |
| |
| 作者单位： | Key Laboratory of Advanced Ceramics and Machining Technology for Ministry of Education，School of Sciences Tianjin University，Key Laboratory of Advanced Ceramics and Machining Technology for Ministry of Education，School of Sciences Tianjin University，Key Laboratory of Advanced Ceramics and Machining Technology for Ministry of Education，School of Sciences Tianjin University，Key Laboratory of Advanced Ceramics and Machining Technology for Ministry of Education，School of Sciences Tianjin University，Key Laboratory of Advanced Ceramics and Machining Technology for Ministry of Education，School of Sciences Tianjin University Tianjin 300072，China，Tianjin 300072，China，Tianjin 300072，China，Tianjin 300072，China，Tianjin 300072，China |
| |
| 基金项目： | NationalNaturalScienceFoundationofChina(No.0072015)，KeyTeacherSupportingProjectofMinistryofEducation(No.20020056018) |
| |
| 摘 要： | In 1972 ,KimandTakahashi1] observedagiantsaturatedmagneticfluxdensity (Bs=2 .5 8T)whichwas 17%strongerthanthatofpureiron .BelievingthattheFe NfilmwasapolycrystallinemixtureofFeandα″ Fe16 N2 ,theydeducedthattheBsofα″ Fe16 N2 wouldbe2 .83Tfromthevolumeratioofα″ Fe16 N2 inthefilm .Sincethelargesaturatedfluxdensityisofimportance ,boththeoreticallyandfromthepointofviewofpracticalapplications,manyresearchershavemadegreateffortsandusedavarietyofmethodstosynthesizeα″ Fe16 N2 intobulkmat…
|
Epitaxial α″-Fe16N2 Films Grown on NaCl (001)by Facing Target Sputtering |
| |
| ZHAO Ci,JIANG En yong,XU Ying hua,ZHANG Bao feng,WU Ping.Epitaxial α″-Fe16N2 Films Grown on NaCl (001)by Facing Target Sputtering[J].Transactions of Tianjin University,2003,9(2). |
| |
| Authors: | ZHAO Ci JIANG En yong XU Ying hua ZHANG Bao feng WU Ping |
| |
| Abstract: | There is a great interest in obtaining epitaxial α″ nitride phase of iron because of their special ferromagnetic properties. o″-Fe16 N2 thin films have been prepared by facing-target sputtering (FTS) onto NaCl (001) substrates in a mixture of argon(Ar) and N2 gases. The base pressure was 6 × 10 -5 Pa. During sputtering, the partial pressures of Ar and N2 gases were kept constant at 0.3 Pa and 0. 05 Pa respectively. The deposition rate was about 0.2 nm/s. The substrate temperature was held at about 100 ℃. Annealing of the films was sequentially carried out at 150 ℃ for 1 h in vacuum ( at least 10-4 Pa ) to obtain α″-phase. Transmission electron microscope (TEM) observations and X-ray diffraction (XRD) patterns showed that the α″-Fe16N2 epitaxially grew on the NaCl substrates. It was found that the arrangement of the SAD patterns exhibits perfect symmetries. By using super-lattice reflections, the lattice constants a = b = (5.71 ±0.02) × 10 -1nm and c = (6.30 ±0.04) × 10-1nm of the α″-phase with a body-centered tetragonal (BCT) structure were determined, which was very close to the results obtained by Jack ( a = b = 5.72 × 10 - 1 nm, c = 6.29 × 10 - 1 nm). The X-ray diffraction patterns and the selected area-diffraction patterns showed that o″-Fe16 N2 epitaxially grew on the NaCl (001) substrate with orientation relationships α″-Fe16 N2 (001) || NaCl (001), α″-Fe16 N2 001 ] || NaCl001]. |
| |
| Keywords: | magnetic moment facing target sputte ring structure |
| 本文献已被 CNKI 万方数据 等数据库收录！ |
