| 共溅射法金属掺杂透明导电ITO薄膜的研究进展 |
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| 引用本文： | 郑泽浩.共溅射法金属掺杂透明导电ITO薄膜的研究进展[J].韩山师范学院学报,2013(6):36-40. |
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| 作者姓名： | 郑泽浩 |
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| 作者单位： | 韩山师范学院物理与电子工程系,广东潮州,521041 |
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| 基金项目： | 韩山师范学院青年科学基金项目（项目编号：LQ101104）. |
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| 摘 要： | 论述了磁控共溅射法在透明导电ITO薄膜中掺杂其他的金属材料的重要性，综述了采用该方法在ITO薄膜上掺杂Zn、Ag、Mn等金属材料后，薄膜光谱透射率的变化，并且对掺杂之后ITO薄膜的结晶情况、微观机理的变化、导电性能与光谱透射特性的内在联系进行归纳总结。
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| 关 键 词： | 进展 ITO薄膜 掺杂 |
Research Progress of the Metal Doped Transparent Conductive ITO Thin Films with Magnetron Co-sputtering Method |
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| ZHENG Ze-hao.Research Progress of the Metal Doped Transparent Conductive ITO Thin Films with Magnetron Co-sputtering Method[J].Journal of Hanshan Teachers College,2013(6):36-40. |
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| Authors: | ZHENG Ze-hao |
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| Institution: | ZHENG Ze-hao |
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| Abstract: | In this article, we summarize the doped ITO thin film with other metal materials such as Zn, Ag and Mn...etc,and the optical transmittance effect on the doped ITO thin film ,using magnetron co-sputtering method, inducing the foundation theory of spectrum transmittance characteristic such as the variety of crystal-lize circumstance, change of micromechanism, conduct electricity function and so on. |
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| Keywords: | progress ITO thin film doped |
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