| 氩氧比对射频反应磁控溅射制备TiO2薄膜亲水性能的影响 |
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| 引用本文： | 高立华,高松华.氩氧比对射频反应磁控溅射制备TiO2薄膜亲水性能的影响[J].三明学院学报,2011,28(5):61-64,87. |
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| 作者姓名： | 高立华 高松华 |
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| 作者单位： | 三明学院物理与机电工程学院,福建三明,365004 |
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| 基金项目： | 福建省教育厅自然科学研究项目，三明市科技计划项目 |
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| 摘 要： | 采用射频磁控溅射法制备了锐钛矿相TiO2薄膜,在基片温度、溅射功率、溅射时间以及靶材与基片间的距离等因素不变的情况下,研究不同氩氧分压比对薄膜亲水性能的影响。通过原子力显微镜(AFM)、X射线衍射光谱(XRD)表征了薄膜的微观表面形貌和晶相组成,采用静态接触角(SCA)评估薄膜的亲水性。实验结果表明不同氩氧比制备的锐钛矿相TiO2薄膜,紫外光照12 h后,接触角降到10o左右,而氩氧比小于等于5:5的接触角都低至5o左右,达到了超亲水性。氩氧分压比为4:6时,样品薄膜的光致亲水性最佳且光照后亲水性的保持较长。
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| 关 键 词： | 射频 磁控溅射 TiO2薄膜 亲水性 |
Effect of Ar/O_2 Ratio on the Hydrophilicity of TiO_2 Thin Films Prepared by RF Reactive Magnetron Sputtering |
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| GAO Li-hua,GAO Song-hua.Effect of Ar/O_2 Ratio on the Hydrophilicity of TiO_2 Thin Films Prepared by RF Reactive Magnetron Sputtering[J].Journal of Sanming University,2011,28(5):61-64,87. |
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| Authors: | GAO Li-hua GAO Song-hua |
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| Institution: | (College of Physics and Electromechanical Engineering,Sanming University,Sanming 365004,China) |
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| Abstract: | TiO2 anatase thin film was prepared by radio frequency magnetron sputtering method.The TiO2 thin film＇s hydrophilicity influenced by oxygen partial pressure was studied when the other technological parameters remained the same,such as substrate temperature,sputtering power,sputtering time and the distance between the sputtering target and the substrate.The surface morphology,crystalline phase and hydrophicity were characterized by atomic force microscope（AFM）,X-ray diffraction spectrum（XRD） and static contact angle（SCTA）,respectively.The results indicate that the prepared TiO2 thin films show the photo-induced hydropholicity after 12 hours irradiation of ultraviolet ray,and it is the best when the ratio between argon and oxygen is 4：6. |
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| Keywords: | radio frequency magnetron sputtering TiO2 thin films hydrophilicity |
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