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卢秉恒 《学位与研究生教育》1987,(5):68-68
对一个高级科研人才来说,创造力和开拓精神与坚实而宽广的理论基础同样是重要的。无疑,每个博士生都有较强的创新欲望。但是,在课程学习及论文工作的全过程中,如果不能自觉地注重创新能力的培养及珍视自己的创新精神,则可能使它受到一些因素的制约,而不能得到良好发展与充分发挥。如课程学习,为了奠定理论基础,有人则偏于被动吸收,单纯积累。实际上,更重要的是培养辩证思维能力和抽象概念的能力,形成智慧。对一些相关学科,我采取了忽略细节,理清各学科要解决什么问题,抓主要思路的学习方法。这样, 相似文献
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Autofocus method based on the analysis of image content information is investigated to reduce the alignment error resulting from mark positioning uncertainty due to defocus in microstructure layered fabrication process based on multilevel imprint lithography, The applicability of several autofocus functions to the alignment mark images is evaluated concerning their uniformity, sharpness near peak, reliability and measure computation efficiency and the most suitable one based on power spectrum in frequency domain (PSFD) is adopted. To solve the problem of too much computation amount needed in PSFD algorithm, the strategy of interested region detection and effective image reconstruction is proposed and the algorithm efficiency is improved. The test results show that the computation time is reduced from 0.316 s to 0.023 s under the same conditions while the other merits of the function are preserved, which indicates that the modified algorithm can meet the mark image autofocusing require-ments in response time, accuracy and robustness. The alignment error due to defocus which is about 0.5 μm indi-cated by experimental results can be reduced or eliminated by the autofocusing implementation. 相似文献
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A novel stereolithgraphy system with conventional UV light as a light source uses the 2D worktable as moving components, whose characteristics determine the accuracy of the prototyping parts. Many factors including mass of the worktable, elasticity and damp coefficients, speed and acceleration affect the non-uniform exposure time of the resin, and eventually influence the cured line shape and the curing accuracy. A light shuttle is used to eliminate the cure errors, greatly improving accuracy of the parts. 相似文献
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Since the optical lithography is reaching its mini- mal structure size limit, alternative lithography tech- niques in the sub-100 nm range should be developed. In recent years, some nontraditional patterning tech- nologies, such as imprint lithography, soft lithogra- phy , and others, with a potentially wider application in microdevice fabrication, have been explored [1-4]. In 1995, nanoimprint lithography (NIL) was pro- posed. NIL technology is a hot subject and a develop- ment trend in the… 相似文献
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A novel stereolithgraphy system with conventional UV light as a light source uses the 2D worktable as moving components,whose characteristics determine the accuracy of the prototyping parts. Many factors including mass of the worktable, elasticity and damp coefficients, speed and acceleration affect the non-uniform exposure time of the resin, and eventually influence the cured line shape and the curing accuracy. A light shuttle is used to eliminate the cure errors, greatly improving accuracy of the parts. 相似文献
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